“We discovered that holographic techniques can shape a laser beam into nondiffracting Bessel beams, rather than traditional Gaussian beams, to achieve nanofabrication deep within a silicon wafer,” explains Tokel. A nondiffracting beam overcomes scattering effects that previously prevented precise energy deposition, and instead induces extremely small, localized voids within the wafer.
Source: Holographic techniques ‘key’ to nanofabrication deep within a silicon wafer | Laser Focus World